【Japanese Only / No English Subtitles】Future Perspectives for Openair-Plasma^® Technology in Electronics, Semiconductors, and Power Semiconductor Products

Important Notice
This webinar will be conducted in Japanese only. English subtitles and interpretation will not be available.
 

Electronics and semiconductors are indispensable to both daily life and social infrastructure. At the same time, demand for power semiconductors, which handle high voltages and large amounts of power through switching operation, continues to grow. As a result, next-generation power semiconductor devices using compound materials such as SiC and GaN, known for their excellent material properties, are being adopted more widely.

Plasmatreat’s atmospheric-pressure plasma technology, Openair-Plasma^®, can provide a wide range of important manufacturing steps that contribute to improving final product quality and increasing production yield. Openair-Plasma^® enables treatment without electrical potential damage, making it an important factor in cost efficiency, simplified production processes, and production stability for electronics and semiconductor products. In this way, it helps ensure reliable component performance.

In this webinar, we will first provide a concise introduction to Openair-Plasma^® technology, explain the added value it can bring to production processes, and show how plasma can be used in electronics manufacturing.

We will also introduce the newly developed Redox Tool unit, which makes it possible to incorporate oxide removal as a continuous inline process. In addition, we will explain the principles of oxide removal using atmospheric-pressure plasma with the help of video demonstrations.

Through actual application examples, participants will gain an understanding of the broad range of applications for Openair-Plasma^® and how it can be used across various market segments in electronics and semiconductor manufacturing.

Webinar Topics

• What is plasma?
• Openair-Plasma^® technology and equipment
• Applications of Openair-Plasma^® in electronics, semiconductors, and power semiconductor manufacturing
• Introduction to the Redox Tool unit
• Principles and application examples of oxide removal using atmospheric-pressure plasma

 This webinar is scheduled to run for approximately 50 minutes, including the Q&A session. If you have any questions or would like to discuss the webinar in advance, please contact us here.

Important Information for Participants

Language
This webinar will be conducted in Japanese only. English subtitles and interpretation will not be available.

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